Thin films deposition via plasma magnetron sputtering
LabLine Kurt J. Lesker Plasma Sputtering System
5 magnetron targets, 4 DC and one RF
One magnetron target for magnetic materials
4 substrates holder with automated indexing for
deposition of individual or multi-layers
Substrates heater up to 450 C
2 Quartz thickness rate monitors (resolution 0.1 A/s)
Atomic Force Microscopy
Park NX 10 SPM
Magnetic Force Microscopy with in-situ H field
Piezo-Force Microscopy
Scanning Tunnelling Microscopy
Sample thermal heating stage (up to 120 C)
Optical IR non-contact GMR testing
Home made system
B field up to 0.5T
RT operation
Nitrogen cooled HCT IR detector
Piezo-tester and polarization hysteresis loop tracer
aixPES Piezo-ferroelectrics tester
RT to 650 C operation temperature for bulk
RT to 120 C operation temperature for thin films
Piezo-displacement with resolution of pm
PE loops, capacitance and dielectric function measurements
Pyroelectric measurements
Fully versatile for customized testing including retention,
fatigue and time effects
Bulk ceramics fabrication line
Cryogenic VSM and MR multi-physics testing
Vibrating Sample Magnetometer
Superconducting 3T magnet
4 - 700 K VSM operation
Cryogen free closed circuit He compressor
Magneto-resistance, I-V and Hall effect measurement probe
4 - 400 K operation for electrical testing probe
Dynamic Light Scattering (DLS)
- particle sizer
Particle size from 3 nm to 3 microns
Outputs:
- Diffusion Coefficient
- Mean Particle Size
- Particles Size Distribution
Magneto-Optic Kerr Effect Instrument